U.S. Particle Accelerator School
Fundamentals of Ion Sources
Sponsoring University:
Michigan State University
Course Name:
Fundamentals of Ion Sources
Instructors:
Guillaume Machicoane, MSU/FRIB; Daniela Leitner, Lawrence Berkeley National Lab; Daniel Winklehner, MIT; Alain Lapierre, MSU/NSCL
Purpose and Audience
The purpose of this course is to introduce students to the physics and
technology of ion sources. The course is suitable for senior undergraduate
students, graduate students, and researchers. The course also can provide a
broader background to engineers and technicians working in the field of
accelerator technology.
Prerequisites
Either previous coursework or a general understanding of classical physics and electromagnetism.
It is the responsibility of the student to ensure that they meet the course prerequisites or have equivalent experience.
Objectives
The goal of the course is to provide a comprehensive introduction and survey of
the field. On completion of the course, students are expected to understand the
basic workings of ion sources and their associated systems, and to have gained a
familiarity with the terminology and concepts of the field such that they can
read and understand the ion source literature. Since ion source research is an
interdisciplinary field, the course will include an introduction to key
technologies used with ion sources including: ultra-high vacuum, high voltage,
materials properties and commonly used beam diagnostics for injectors, and low
energy beam transport.
Instructional Method
A series of morning and afternoon lectures will be given, accompanied by
handouts and discussion and an afternoon in the computer laboratory. Discussion
of topics of particular interest to students will be encouraged. Problem sets
will be assigned as homework, due the next morning. A final exam will be given.
A project work will be assigned on the first day of class.
Course Content
Topics covered will include: Classification of ion sources. Review of plasma and
atomic physics as relevant to ion sources; basic plasma parameters (debye
length, plasma frequency, collisions, transport); ionization and confinement.
Detailed description of various type of positive and negative ion source (EBIS,
ECR, laser, vacuum arc, multicusp, RF sources and ion sources for fusion).
Industrial and medical applications. Formation of a directed ion beam from the
plasma. Extraction systems. Beam transport and modelling of low energy beam
transport systems. Space charge and space charge compensation in beam transport
lines; Beam diagnostics. Technology of ion source including: Ultra-High Vacuum,
High Voltage components, Material properties.
Reading Requirements
(to be provided by the USPAS) "The Physics and Technology of Ion Sources" (2nd Edition), by I.G. Brown, Wiley and Sons Publishers, 2004. Additional reading suggestion would be the proceedings of the CAS - CERN Accelerator School, Ion Sources-2012.
Credit Requirements
Students will be evaluated based on performance as follows: final exam (30% of final grade), homework assignments (40% of final grade), and their project work (30%).
Michigan State University course number: PHY 905 - 304 - Fundamentals of Ion Sources
Indiana University course number: Physics 671, Advanced Topics in Accelerator Physics
MIT course number: 8.790, Accelerator Physics